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American Vacuum Society
In-plasma photo-assisted etching of Si with chlorine aided by an external vacuum ultraviolet source
Linfeng Du
Demetre J. Economou
Vincent M. Donnelly
J. Vac. Sci. Technol. B.2022.40:022207
aip.org
aip.org
iText 4.2.0 by 1T3XT2022-02-25T07:30:53-08:00
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